Ultra Cleaning with Supercritical CO2

    Achieve sub-nanometer particulate and non-volatile organic residue removal for sensitive electronics, optics, and medical devices without toxic solvent waste or mechanical stress.

    0 mN/m

    Surface Tension

    < 10 nm

    Feature Penetration

    99.5%

    CO₂ Closed Loop Recycle

    100%

    Dry Process (No Water)

    Explore our systems for Ultra Cleaning

    Core Advantages

    Zero Residue

    Complete gas off-gassing upon depressurization ensures 0% solvent staining, water spots, or liquid entrapment.

    Solvent-Free

    Replaces hazardous organic solvents like IPA, NMP, and acetone with non-toxic, non-flammable recycled CO₂.

    Micro-Pore Penetration

    Zero surface tension enables full cleaning inside high-aspect ratio channels, MEMS gaps, and 3D printed lattice meshes.

    Eco Closed-Loop

    Integrated distillation recycles 99.5% of process CO₂, drastically cutting operational chemical expenses.

    Target Applications

    Semiconductors

    Removes photoresist remnants and sub-10nm etch particulates without pattern collapse on delicate nanostructures.

    Medical Implants

    Extracts machining lubricants and unreacted monomers from vascular stents, orthopedic implants, and catheters.

    Óptica de Precisión

    Cleans space-grade mirrors, diffraction gratings, and infrared optics without micro-abrasion or drying spots.

    Additive Manufacturing

    Flushes un-sintered polymer/metal powders from internal cooling channels and porous lattice structures.